Handbook of Chemical Vapor Deposition

Handbook of Chemical Vapor Deposition

EnglishHardbackPrint on demand
Pierson Hugh O.
William Andrew Publishing
EAN: 9780815513001
Print on demand
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Detailed information

Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
EAN 9780815513001
ISBN 0815513003
Binding Hardback
Publisher William Andrew Publishing
Publication date January 1, 1999
Pages 458
Language English
Dimensions 229 x 152
Country United States
Readership Professional & Scholarly
Authors Pierson Hugh O.
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