Handbook of Chemical Vapor Deposition

Handbook of Chemical Vapor Deposition

AngličtinaPevná väzbaTlač na objednávku
Pierson Hugh O.
William Andrew Publishing
EAN: 9780815514329
Tlač na objednávku
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Podrobné informácie

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
EAN 9780815514329
ISBN 0815514328
Typ produktu Pevná väzba
Vydavateľ William Andrew Publishing
Dátum vydania 1. septembra 1999
Stránky 506
Jazyk English
Rozmery 229 x 152
Krajina United States
Čitatelia Professional & Scholarly
Autori Pierson Hugh O.
Edícia 2 ed